Characterisation and Defect Analysis of 2D Layered Ternary Chalcogenides
- Abstract number
- 16
- Presentation Form
- Poster
- Corresponding Email
- [email protected]
- Session
- Poster Session 1
- Authors
- Mr. Tigran Simonian (1, 3, 4), Dr. Ahin Roy (1, 3, 4), Prof. Zdeněk Sofer (2), Prof. Valeria Nicolosi (1, 3, 4)
- Affiliations
-
1. Advanced Microscopy Lab, Trinity College Dublin
2. University of Chemistry and Technology Prague
3. CRANN/AMBER, Trinity College Dublin
4. School of Chemistry, Trinity College Dublin
- Keywords
TlGaSe2, HRTEM, HRSTEM, EDX, EELS, DFT, Characterisation
- Abstract text
TlGaX2 [X = Se, S, Te] is a family of layered 2-D ternary chalcogenides. These p-type semiconductors have band gaps within the green to ultraviolet range [1] [2] [3], which makes them ideal candidates for optoelectronic applications.
Current examples of such applications, such as phototransistors [4] and detectors [5] [6], make use of multistep processes, such as mechanical exfoliation with a PMMA transfer [4], or thin film synthesis via thermal evaporation [6], which makes potential future scalability of these devices cumbersome. Liquid phase exfoliation (LPE) is a far more facile process that has been shown to work for a large number of layered van der Waals materials [7]. Herein, we demonstrate that these TlGaX2 materials can be exfoliated with a facile one step sonication in IPA, leaving behind little to no residue.
While there have been a number of studies into the electronic structure of these materials, an exact description of their band structures has yet to be established [6]. Interestingly, despite defect quantification being an important structure-property relationship in semiconductors, none of its aspects, e.g. stoichiometry, charge states, structural defects, etc., have yet been fully addressed. For example, while it was reported that Se vacancies in TlGaSe2 can lead to a change in the nature and size of the bandgap, a quantitative relationship was not determined [2].
In this work, we use high-resolution scanning transmission electron microscopy (HRSTEM), in combination with EDX/EELS, to experimentally address this aspect of defects in TlGaSe2. Our experiments clearly indicate the presence of stacking faults (as were seen previously in XRD studies with bulk TlGaSe2 [8], and with isostructural KInS2 [9]) and surface relaxation in LPE-TlGaSe2. Furthermore, we show a transient formation of a 1-D structure along the edges of TlGaSe2 flakes, catalysed by intense electron beam exposure in the microscope. Using complimentary density functional theory (DFT) simulations, we explore the effect of defects on the electronic structure, and rationalise the transient formation of the 1-D structure.
- References
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